Title :
The photoinduced metallo-organic decomposition process: a novel technique for dielectric thin-film growth
Author :
Huang, Charles H J ; Rabson, Thomas A.
Author_Institution :
Dept. of Electr. & Comput. Eng., Rice Univ., Houston, TX, USA
Abstract :
A novel photoinduced metallo-organic decomposition (PIMOD) process has been developed for growing high-quality lithium niobate films on silicon or sapphire substrates. Crack- and interdiffusion-free films have been grown by the PIMOD process at a lower temperature for a shorter processing time than those required for the conventional MOD process. The electrical, optical, and electrooptical properties of the PIMOD-derived films are reported.<>
Keywords :
dielectric thin films; electro-optical effects; lithium compounds; optical waveguides; permittivity; vapour phase epitaxial growth; Al/sub 2/O/sub 3/; C-V characteristics; I-V characteristics; LiNbO/sub 3/ films; PIMOD process; Si substrate; crackfree films; dielectric constant; dielectric thin-film growth; electrooptical properties; epitaxial film; interdiffusion-free films; optical waveguide; photoinduced metallo-organic decomposition; sapphire substrates; Annealing; Dielectric thin films; Furnaces; Ion beams; Lithium niobate; Molecular beam epitaxial growth; Optical films; Semiconductor films; Substrates; Temperature;
Journal_Title :
Electron Device Letters, IEEE
