The photoinduced metallo-organic decomposition process: a novel technique for dielectric thin-film growth

Author

Huang, Charles H J ; Rabson, Thomas A.

Author_Institution

Dept. of Electr. & Comput. Eng., Rice Univ., Houston, TX, USA

Volume

13

Issue

12

fYear

1992

Firstpage

609

Lastpage

611

Abstract

A novel photoinduced metallo-organic decomposition (PIMOD) process has been developed for growing high-quality lithium niobate films on silicon or sapphire substrates. Crack- and interdiffusion-free films have been grown by the PIMOD process at a lower temperature for a shorter processing time than those required for the conventional MOD process. The electrical, optical, and electrooptical properties of the PIMOD-derived films are reported.<>

Keywords

dielectric thin films; electro-optical effects; lithium compounds; optical waveguides; permittivity; vapour phase epitaxial growth; Al/sub 2/O/sub 3/; C-V characteristics; I-V characteristics; LiNbO/sub 3/ films; PIMOD process; Si substrate; crackfree films; dielectric constant; dielectric thin-film growth; electrooptical properties; epitaxial film; interdiffusion-free films; optical waveguide; photoinduced metallo-organic decomposition; sapphire substrates; Annealing; Dielectric thin films; Furnaces; Ion beams; Lithium niobate; Molecular beam epitaxial growth; Optical films; Semiconductor films; Substrates; Temperature;

fLanguage

English

Journal_Title

Electron Device Letters, IEEE

Publisher

ieee

ISSN

0741-3106

Type

jour

DOI

10.1109/55.192860

Filename

192860