• DocumentCode
    850319
  • Title

    Analytical Investigation of Neutron Hardening of Integrated Injection Logic

  • Author

    Pease, R.L.

  • Author_Institution
    Mission Research Corporation 1400 San Mateo Boulevard, S.E., Suite A Albuquerque, New Mexico 87108
  • Volume
    27
  • Issue
    6
  • fYear
    1980
  • Firstpage
    1395
  • Lastpage
    1401
  • Abstract
    An analytical technique is presented for investigating the neutron induced degradation of integrated injection logic (I2L) inverter cells as a function of basic processing variables. The technique combines a one-dimensional semiconductor device code, the PN code, with the circuit analysis code SPICE. Predictions of neutron induced degradation as a function of npn transistor base doping, epitaxial thickness and resistivity and pnp transistor base width are presented for a second generation I2L technology. A comparison of predicted response to experimental data is given for inverter cells fabricated with different npn base doping and epitaxial thickness.
  • Keywords
    Charge carrier lifetime; Degradation; Doping profiles; Geometry; Implants; Logic devices; Neutrons; Pulse inverters; Semiconductor diodes; Semiconductor process modeling;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1980.4331040
  • Filename
    4331040