DocumentCode :
850336
Title :
High Dose Rate Burnout in Silicon Epitaxial Transistors
Author :
Wrobel, T.F. ; Azarewicz, J.L.
Author_Institution :
Mission Research Corporation La Jolla, California 92038
Volume :
27
Issue :
6
fYear :
1980
Firstpage :
1411
Lastpage :
1415
Abstract :
This paper presents experimental results for ionizing radiation-induced burnout in n-p-n transistors. The results indicate a dose-rate and a collector bias threshold for transistor burnout. The collector voltage threshold was shown to be on the order of 2/3 BVCEO and the dose-rate threshold was shown to be on the order of 2 × 1010 rad(Si)/s. The triggering mechanism was postulated to be caused by high current injection which results in avalanche breakdown fields developing across the n-n+ substrate boundary.
Keywords :
Avalanche breakdown; Capacitors; Charge carrier lifetime; Circuit testing; Doping; Gold; Ionizing radiation; Silicon; Substrates; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1980.4331042
Filename :
4331042
Link To Document :
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