• DocumentCode
    850475
  • Title

    Adjustment of laser facet film reflectivity by ablation etching

  • Author

    Takeshita, Tatsuya ; Sugo, Mitsuru ; Shibata, Yasuo ; Kamioka, Hiroyuki ; Tohmori, Yuichi

  • Author_Institution
    NTT Photonics Labs., NTT Corp., Kanagawa, Japan
  • Volume
    16
  • Issue
    1
  • fYear
    2004
  • Firstpage
    42
  • Lastpage
    44
  • Abstract
    We demonstrate reflectivity adjustment of a film-coated laser facet using ablation etching. The lasing is restrained by laser ablation etching of the facet film of a semiconductor laser and starts again with additional laser ablation etching. The laser ablation etching is useful not only for identifying more than λ0/(4nfilm) thickness of the coated film but also for adjusting facet coating thickness.
  • Keywords
    antireflection coatings; laser ablation; laser beam etching; optical fabrication; quantum well lasers; reflectivity; waveguide lasers; antireflection facet; film-coated laser facet; high reliability; laser ablation etching; reflectivity adjustment; ridge waveguide structure; semiconductor laser; spontaneous emission; strained-quantum well; Coatings; Etching; Laser ablation; Optical films; Optical pulses; Pulsed laser deposition; Reflectivity; Semiconductor films; Semiconductor lasers; Waveguide lasers;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2003.820462
  • Filename
    1255945
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=850475