• DocumentCode
    851854
  • Title

    A polynomial time-optimal diode insertion/routing algorithm for fixing antenna problem [IC layout]

  • Author

    Huang, Li-Da ; Tang, Xiaoping ; Xiang, Hua ; Wong, D.F. ; Liu, I-Min

  • Author_Institution
    Dept. of Comput. Sci., Univ. of Texas, Austin, TX, USA
  • Volume
    23
  • Issue
    1
  • fYear
    2004
  • Firstpage
    141
  • Lastpage
    147
  • Abstract
    The antenna problem is a phenomenon of plasma-induced gate-oxide degradation. It directly affects manufacturability of very large scale integration (VLSI) circuits, especially in deep submicron technology using high-density plasma. Diode insertion is a very effective way to solve this problem. Ideally, diodes are inserted directly under the wires that violate antenna rules. But in today\´s high-density VLSI layouts, there is simply not enough room for "under-the-wire" diode insertion for all wires. Thus, it is necessary to insert many diodes at legal "off-wire" locations and extend the antenna-rule violating wires to connect to their respective diodes. Previously, only simple heuristic algorithms were available for this diode insertion and routing problem. In this paper, we show that the diode insertion and routing problem for an arbitrary given number of routing layers can be optimally solved in polynomial time. Our algorithm guarantees finding a feasible diode insertion and routing solution whenever one exists. Moreover, we can guarantee to find a feasible solution to minimize a cost function of the form α×L+β×N, where L is the total length of extension wires and N is the total number of vias on the extension wires. Experimental results show that our algorithm is very efficient.
  • Keywords
    VLSI; circuit optimisation; integrated circuit interconnections; integrated circuit layout; integrated circuit metallisation; integrated circuit reliability; VLSI manufacturability; VLSI reliability; VLSI yield; antenna problem; antenna-rule violating wires; cost function minimization; diode insertion/routing algorithm; extension wire vias; high-density plasma; optimization; plasma-induced gate oxide degradation; polynomial time-optimal algorithm; Degradation; Diodes; Integrated circuit layout; Integrated circuit manufacture; Law; Plasma materials processing; Polynomials; Routing; Very large scale integration; Wires;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.2003.819888
  • Filename
    1256064