Title :
Laser-produced plasma light source for extreme ultraviolet lithography
Author :
Shields, Harry ; Fornaca, Steven W. ; Petach, Michael B. ; Orsini, Rocco A. ; Moyer, Richard H. ; Pierre, Randall J St
Author_Institution :
TRW Space & Electron., Redondo Beach, CA, USA
fDate :
10/1/2002 12:00:00 AM
Abstract :
Pulsed Nd:YAG lasers have been developed to achieve high peak power and high pulse repetition rate. These systems are being used as drivers for laser-produced plasmas which efficiently convert the 1064-nm laser output to extreme ultraviolet (EUV) light at 13.5 nm for future microlithography systems. The requirements for laser-produced plasma EUV light sources and their integration in lithography tools for high-volume manufacturing are reviewed to establish the key design issues for high-power lasers and plasma targets. Xenon has been identified as a leading target material to realize the goals of intense EUV emission and clean operation. Recent progress in high-power diode-pumped Nd:YAG lasers and xenon targets for EUV generation is reviewed, showing that laser-produced plasma sources meet the needs for current EUV lithography development tools. Future directions to meet EUV source requirements for high-volume manufacturing tools are discussed.
Keywords :
integrated circuit manufacture; light sources; neodymium; plasma production by laser; solid lasers; ultraviolet lithography; 13.5 nm; EUV light sources; EUV lithography development tools; Xe; Xe target material; YAG:Nd; YAl5O12:Nd; clean operation; design issues; extreme ultraviolet lithography; high peak power; high pulse repetition rate; high-power lasers; high-volume manufacturing; intense EUV emission; laser-produced plasma light source; microlithography; plasma targets; pulsed Nd:YAG lasers; Light sources; Lithography; Manufacturing; Optical design; Optical pulses; Plasma materials processing; Plasma sources; Power lasers; Ultraviolet sources; Xenon;
Journal_Title :
Proceedings of the IEEE
DOI :
10.1109/JPROC.2002.803660
