DocumentCode :
854855
Title :
Atmospheric pressure discharge plasma decomposition for gaseous air contaminants-trichlorotrifluoroethane and trichloroethylene
Author :
Oda, Tetsuji ; Yamashita, Ryuichi ; Takahashi, Tadashi ; Masuda, Senichi
Author_Institution :
Dept. of Electr. Eng., Tokyo Univ., Japan
Volume :
32
Issue :
2
fYear :
1996
Firstpage :
227
Lastpage :
232
Abstract :
The decomposition performance of gaseous environmental destructive contaminants in air by using atmospheric pressure discharge plasma including the surface discharge induced plasma chemical processing (SPCP) was examined. The main contaminants tested were chlorofluorocarbon (CFC-113) and trichloroethylene, typically. The discharge exciting frequency range studied was wide-50 Hz to 50 kHz. Results showed the low frequency discharge requires high voltage to inject high electric power in the gas and to decompose the contaminants. A gas chromatograph mass spectrometer was used to analyze discharge products of dense CFC-113 or trichloroethylene. Among the detected products were HCl, CCIFO, and CHCl3. Two different electrode configurations; the silent discharge (coaxial) electrode and the coil-electrode were also tested and compared to each other as a gas reactor
Keywords :
chemical variables measurement; chromatography; electrodes; plasma applications; plasma devices; surface discharges; waste disposal; 50 Hz to 50 kHz; CCIFO; CFC-113; CHCl3; HCl; atmospheric pressure discharge plasma decomposition; chlorofluorocarbon; coaxial electrode; coil-electrode; discharge exciting frequency; gas chromatograph mass spectrometer; gas reactor; gaseous air contaminants; high electric power injection; low frequency discharge; silent discharge electrode; surface discharge induced plasma chemical processing; trichloroethylene; trichlorotrifluoroethane; Atmospheric-pressure plasmas; Chemical processes; Electrodes; Frequency; Plasma chemistry; Plasma materials processing; Surface contamination; Surface discharges; Testing; Voltage;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/28.491469
Filename :
491469
Link To Document :
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