Title :
The mechanism of ultraviolet bonding of perfluoropolyether lubricants [used in magnetic recording]
Author :
Vurens, G.H. ; Gudeman, C.S. ; Lin, L.J. ; Foster, J.S.
Author_Institution :
IBM Almaden Res. Center, San Jose, CA, USA
fDate :
1/1/1993 12:00:00 AM
Abstract :
It has recently been reported that thin films of perfluoropolyethers can be bonded to a variety of substrates under illumination with 185-nm ultraviolet light. In the present work, the authors examine the mechanism through which the bonding of the perfluoropolyethers to the substrate takes place. The perfluoropolyethers undergo dissociative electron attachment caused by photoelectrons that are generated by the interaction of the ultraviolet light with the substrate. This dissociative electron attachment results in the formation of a negative ion and a radical. It is suggested that subsequent radical propagation and termination steps then cross-link the perfluoropolyether and bond it to the substrate
Keywords :
electron attachment; lubrication; magnetic recording; molecular photodissociation; polymer films; 185 nm; UV bonding mechanism; crosslinking; dissociative electron attachment; magnetic recording; negative ion; perfluoropolyether lubricants; photoelectrons; polymer film lubricants; radical; Bonding; Chemical industry; Electrons; Lighting; Lubricants; Magnetic recording; Substrates; Temperature sensors; Thermal stability; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
