Coercivity control of RF magnetron sputtered CoCr films by external magnetic field

Author

Uchiyama, Y. ; Sato, H. ; Kitamoto, Y. ; Hwang, U.

Author_Institution

Digital Equipment Corp., Yokohama, Japan

Volume

26

Issue

5

fYear

1990

fDate

9/1/1990 12:00:00 AM

Firstpage

1617

Lastpage

1619

Abstract

CoCr films were prepared on glass substrates with uniform magnetic fields applied perpendicular to the substrate surface. When the magnetic field was varied from 0 to 96 Oe, the perpendicular coercivity of 20 at.% CrCo films made at an Ar pressure of 1.5 mtorr increased from about 100 to 850 Oe. The c-axis dispersion slightly increased by about a degree. At a magnetic field of 96 Oe, a lower Ar pressure of 1 mtorr resulted in a higher coercivity of 1000 Oe. X-ray analysis revealed a correlation between the coercivity and the microstrain as well as lattice coherency

Keywords

chromium alloys; cobalt alloys; coercive force; magnetic thin films; sputtered coatings; 1 to 1.5 mtorr; Ar pressure; CoCr; RF magnetron sputtered CoCr films; X-ray analysis; c-axis dispersion; external magnetic field; glass substrates; lattice coherency; microstrain; perpendicular coercivity; uniform magnetic fields; Argon; Coercive force; Magnetic fields; Magnetic films; Magnetic separation; Perpendicular magnetic recording; Plasma confinement; Radio frequency; Sputtering; Substrates;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.104466

Filename

104466