Title :
Coercivity control of RF magnetron sputtered CoCr films by external magnetic field
Author :
Uchiyama, Y. ; Sato, H. ; Kitamoto, Y. ; Hwang, U.
Author_Institution :
Digital Equipment Corp., Yokohama, Japan
fDate :
9/1/1990 12:00:00 AM
Abstract :
CoCr films were prepared on glass substrates with uniform magnetic fields applied perpendicular to the substrate surface. When the magnetic field was varied from 0 to 96 Oe, the perpendicular coercivity of 20 at.% CrCo films made at an Ar pressure of 1.5 mtorr increased from about 100 to 850 Oe. The c-axis dispersion slightly increased by about a degree. At a magnetic field of 96 Oe, a lower Ar pressure of 1 mtorr resulted in a higher coercivity of 1000 Oe. X-ray analysis revealed a correlation between the coercivity and the microstrain as well as lattice coherency
Keywords :
chromium alloys; cobalt alloys; coercive force; magnetic thin films; sputtered coatings; 1 to 1.5 mtorr; Ar pressure; CoCr; RF magnetron sputtered CoCr films; X-ray analysis; c-axis dispersion; external magnetic field; glass substrates; lattice coherency; microstrain; perpendicular coercivity; uniform magnetic fields; Argon; Coercive force; Magnetic fields; Magnetic films; Magnetic separation; Perpendicular magnetic recording; Plasma confinement; Radio frequency; Sputtering; Substrates;
Journal_Title :
Magnetics, IEEE Transactions on
