Title :
Microstructure of coevaporated CoCr films with perpendicular anisotropy
Author :
van Kranenburg, H. ; Lodder, J.C. ; Maeda, Y. ; Toth, L. ; Popma, J.A.
Author_Institution :
Twente Univ., Enschede, Netherlands
fDate :
9/1/1990 12:00:00 AM
Abstract :
Coevaporation of Co and Cr is applied to achieve good magnetic characteristics of media deposited at low temperature. The opposed oblique incidence vapor flux induces a columnar alignment parallel to the evaporation plane. Further, a process-induced segregation is present which introduces separated Co-rich and Cr-rich regions. A selective etching process is carried out to find proof of this. With increasing process temperature, nonelongated columns develop. The columnar axes are inclined towards the Co source at a smaller angle than the angle of incidence. The texture axes are also inclined, as are the anisotropy axes. The process-induced segregation results in an enhanced coercivity and saturation magnetization. A small in-plane anisotropy coincides with the direction of columnar alignment. At a higher process temperature, the column, texture, and anisotropy axis tilting decreases
Keywords :
chromium alloys; cobalt alloys; coercive force; crystal microstructure; etching; magnetic anisotropy; magnetic thin films; magnetisation; segregation; texture; vapour deposited coatings; coevaporated CoCr films; columnar alignment; enhanced coercivity; in-plane anisotropy; low temperature; magnetic characteristics; microstructure; nonelongated columns; opposed oblique incidence vapor flux; perpendicular anisotropy; process temperature; process-induced segregation; saturation magnetization; selective etching; texture axes; Anisotropic magnetoresistance; Chromium; Magnetic anisotropy; Magnetic films; Magnetic flux; Magnetic separation; Microstructure; Perpendicular magnetic anisotropy; Saturation magnetization; Temperature;
Journal_Title :
Magnetics, IEEE Transactions on