DocumentCode
857494
Title
Comparison of optical losses in dielectric-apertured vertical-cavity lasers
Author
Floyd, P.D. ; Thibeault, B.J. ; Hegblom, E.R. ; Ko, J. ; Coldren, L.A. ; Merz, J.L.
Author_Institution
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
Volume
8
Issue
5
fYear
1996
fDate
5/1/1996 12:00:00 AM
Firstpage
590
Lastpage
592
Abstract
The performance of vertical-cavity lasers (VCL´s) employing dielectric apertures formed by lateral oxidation or wet-etch undercutting of an AlAs layer on a common substrate are compared. Although both device types performed well, extracted optical losses from the wet-etch undercut structures exceed those of AlAs-oxide apertured lasers. The difference in performance is attributed to optical scattering losses specific to the aperture fabrication method, enhanced by loss from the larger index of refraction discontinuity of the air-gap aperture relative to the AlAs-oxide aperture.
Keywords
distributed Bragg reflector lasers; etching; laser cavity resonators; light scattering; optical losses; oxidation; quantum well lasers; Al/sub 0.5/Ga/sub 0.5/As; AlAs; AlAs layer; AlAs-oxide apertured lasers; GaAs-Al/sub 0.67/Ga/sub 0.33/:Be; In/sub 0.17/Ga/sub 0.83/As; air-gap aperture; aperture fabrication method; dielectric-apertured vertical-cavity lasers; index of refraction discontinuity; lateral oxidation; optical scattering losses; performance; wet-etch undercut structures; wet-etch undercutting; Apertures; Dielectric losses; Dielectric substrates; Optical devices; Optical losses; Optical refraction; Optical scattering; Oxidation; Performance loss; Vertical cavity surface emitting lasers;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.491548
Filename
491548
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