DocumentCode :
857494
Title :
Comparison of optical losses in dielectric-apertured vertical-cavity lasers
Author :
Floyd, P.D. ; Thibeault, B.J. ; Hegblom, E.R. ; Ko, J. ; Coldren, L.A. ; Merz, J.L.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
Volume :
8
Issue :
5
fYear :
1996
fDate :
5/1/1996 12:00:00 AM
Firstpage :
590
Lastpage :
592
Abstract :
The performance of vertical-cavity lasers (VCL´s) employing dielectric apertures formed by lateral oxidation or wet-etch undercutting of an AlAs layer on a common substrate are compared. Although both device types performed well, extracted optical losses from the wet-etch undercut structures exceed those of AlAs-oxide apertured lasers. The difference in performance is attributed to optical scattering losses specific to the aperture fabrication method, enhanced by loss from the larger index of refraction discontinuity of the air-gap aperture relative to the AlAs-oxide aperture.
Keywords :
distributed Bragg reflector lasers; etching; laser cavity resonators; light scattering; optical losses; oxidation; quantum well lasers; Al/sub 0.5/Ga/sub 0.5/As; AlAs; AlAs layer; AlAs-oxide apertured lasers; GaAs-Al/sub 0.67/Ga/sub 0.33/:Be; In/sub 0.17/Ga/sub 0.83/As; air-gap aperture; aperture fabrication method; dielectric-apertured vertical-cavity lasers; index of refraction discontinuity; lateral oxidation; optical scattering losses; performance; wet-etch undercut structures; wet-etch undercutting; Apertures; Dielectric losses; Dielectric substrates; Optical devices; Optical losses; Optical refraction; Optical scattering; Oxidation; Performance loss; Vertical cavity surface emitting lasers;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.491548
Filename :
491548
Link To Document :
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