Deep-submicron structures in YBCO: fabrication and measurements

Author

van der Harg, A.J.M. ; van der Drift, E. ; Hadley, P.

Author_Institution

DIMES, Delft, Netherlands

Volume

5

Issue

2

fYear

1995

fDate

6/1/1995 12:00:00 AM

Firstpage

1448

Lastpage

1451

Abstract

We present a fabrication method that consistently produces superconducting structures with lateral dimensions down to 100 nm. The etching is done in a Distributed Electron Cyclotron (ECR-) etcher using a plasma of argon and oxygen. The sample is water cooled. Degradation of the etched structures is very limited. We discuss electrical measurements on long, narrow lines and constrictions.<>

Keywords

barium compounds; critical current density (superconductivity); electron device manufacture; high-temperature superconductors; pulsed laser deposition; sputter etching; superconducting microbridges; superconducting thin films; superconducting transition temperature; superconductive tunnelling; yttrium compounds; 100 nm; YBa/sub 2/Cu/sub 3/O/sub 7/; YBa/sub 2/Cu/sub 3/O/sub 7/ films; bridge fabrication; constrictions; critical current density; critical temperature; deep-submicron structures; degradation; distributed electron cyclotron resonance etching; electrical measurements; laser ablation; long narrow lines; water cooled; Argon; Cyclotrons; Degradation; Electric variables measurement; Electrons; Etching; Fabrication; Plasma applications; Plasma measurements; Yttrium barium copper oxide;

fLanguage

English

Journal_Title

Applied Superconductivity, IEEE Transactions on

Publisher

ieee

ISSN

1051-8223

Type

jour

DOI

10.1109/77.402838

Filename

402838