Title :
Deep-submicron structures in YBCO: fabrication and measurements
Author :
van der Harg, A.J.M. ; van der Drift, E. ; Hadley, P.
Author_Institution :
DIMES, Delft, Netherlands
fDate :
6/1/1995 12:00:00 AM
Abstract :
We present a fabrication method that consistently produces superconducting structures with lateral dimensions down to 100 nm. The etching is done in a Distributed Electron Cyclotron (ECR-) etcher using a plasma of argon and oxygen. The sample is water cooled. Degradation of the etched structures is very limited. We discuss electrical measurements on long, narrow lines and constrictions.<>
Keywords :
barium compounds; critical current density (superconductivity); electron device manufacture; high-temperature superconductors; pulsed laser deposition; sputter etching; superconducting microbridges; superconducting thin films; superconducting transition temperature; superconductive tunnelling; yttrium compounds; 100 nm; YBa/sub 2/Cu/sub 3/O/sub 7/; YBa/sub 2/Cu/sub 3/O/sub 7/ films; bridge fabrication; constrictions; critical current density; critical temperature; deep-submicron structures; degradation; distributed electron cyclotron resonance etching; electrical measurements; laser ablation; long narrow lines; water cooled; Argon; Cyclotrons; Degradation; Electric variables measurement; Electrons; Etching; Fabrication; Plasma applications; Plasma measurements; Yttrium barium copper oxide;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
