• DocumentCode
    857670
  • Title

    Ridge-width dependence on high-temperature continuous-wave operation of native oxide-confined InGaAsN triple-quantum-well lasers

  • Author

    Liu, C.Y. ; Yoon, S.F. ; Fan, W.J. ; Uddin, A. ; Yuan, Song

  • Author_Institution
    Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
  • Volume
    18
  • Issue
    6
  • fYear
    2006
  • fDate
    3/15/2006 12:00:00 AM
  • Firstpage
    791
  • Lastpage
    793
  • Abstract
    InGaAsN triple-quantum-well (TQW) ridge waveguide (RWG) lasers were fabricated with contact ridge width of 4, 10, 50, and 100 μm, respectively, using pulsed anodic oxidation (PAO). All these lasers worked under continuous-wave operation up to 100/spl deg/C. A clear trend of improved characteristic temperature (T0) was observed as the ridge width narrowed. Proper choosing of ridge height and optimized PAO process were believed to minimize the lateral spreading current and reduce the scattering losses at the etched RWG sidewall, both of which are beneficial to the narrow ridge lasers operation. High output power of 298.8 mW, low transparency current density of 130 A/cm2/well, and high T0 of 157.2 K were obtained from InGaAsN TQW 4-μm-width lasers.
  • Keywords
    III-V semiconductors; current density; etching; gallium arsenide; indium compounds; optical fabrication; oxidation; quantum well lasers; ridge waveguides; waveguide lasers; wide band gap semiconductors; 10 mum; 100 mum; 157.2 K; 298.8 mW; 4 mum; 50 mum; InGaAsN; InGaAsN triple-quantum-well lasers; contact ridge width; current density; lateral spreading current; native oxide-confinement; pulsed anodic oxidation; ridge waveguide lasers; scattering losses; transparency; Current density; Etching; Optical pulses; Oxidation; Power generation; Power lasers; Scattering; Space vector pulse width modulation; Temperature; Waveguide lasers; Characteristic temperature; InGaAsN; pulsed anodic oxidation (PAO); ridge waveguide (RWG) lasers;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2006.871697
  • Filename
    1603654