Title :
In-situ optical diagnosis during pulsed laser deposition of high-T/sub c/ superconductor thin films
Author :
Li, Q. ; Liu, S. ; Fenner, D.B. ; Luo, J. ; Hamblen, W.D. ; Haigis, J.
Author_Institution :
AFR Inc., East Hartford, CT, USA
fDate :
6/1/1995 12:00:00 AM
Abstract :
A new concept to achieve real-time optical diagnosis during pulsed laser deposition (PLD) of multilayered high temperature superconductor (HTS) thin films was developed. We have constructed a prototype instrument, which combines ultraviolet (UV) and visible (VIS) emission spectroscopy of the substrate and thin-film structure. The UV/VIS emission spectroscopy offers a convenient tool for monitoring the excited atoms, molecules, and ions in the ablation plume, providing in-situ data related to the metal (e.g. Y:Ba:Cu) composition of the plasma. The FT-IR monitoring provides in-situ data on the growing film, including layer thickness, deposition rate, dielectric constant, substrate temperature, free-carrier concentration, carrier scattering time, and DC conductivity, all related to the film quality.<>
Keywords :
Fourier transform spectra; barium compounds; carrier density; electrical conductivity; high-temperature superconductors; infrared spectra; permittivity; photoemission; pulsed laser deposition; superconducting thin films; ultraviolet photoelectron spectra; yttrium compounds; DC conductivity; FT-IR monitoring; YBaCuO; ablation plume; carrier scattering time; deposition rate; dielectric constant; excited atoms; excited ions; excited molecules; film quality; free-carrier concentration; high-T/sub c/ superconductor thin films; layer thickness; optical diagnosis; pulsed laser deposition; substrate temperature; ultraviolet emission spectroscopy; visible emission spectroscopy; High temperature superconductors; Monitoring; Optical films; Optical pulses; Optical scattering; Pulsed laser deposition; Spectroscopy; Stimulated emission; Substrates; Superconducting thin films;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
