DocumentCode :
857832
Title :
The role of magnet arrangement in synthesis of YBCO thin films by on-axis DC magnetron sputtering
Author :
Zhang, Y.Z. ; Yeh, W.J.
Author_Institution :
Dept. of Phys., Idaho Univ., Moscow, ID, USA
Volume :
5
Issue :
2
fYear :
1995
fDate :
6/1/1995 12:00:00 AM
Firstpage :
1517
Lastpage :
1520
Abstract :
We have investigated various processes of DC magnetron sputtering films with on-axis geometry. The study shelved that the quality of YBCO thin films not only depended on the sputtering parameters such as gas pressure, DC voltage, and substrate temperature, but also depended on the structure of the magnetron sputtering gun. A variety of magnet configurations have been tested. We have identified several magnet arrangements with which high quality YBCO thin films could be obtained. With suitable magnet arrangements and optimal sputtering parameters, large area and high quality YBCO thin films could be fabricated with T/sub c/s about 90 K, J/sub c/s of 10/sup 6/ A/cm/sup 2/ at 77 K and zero field, and the transition width less than 1 K.<>
Keywords :
barium compounds; critical current density (superconductivity); high-temperature superconductors; sputter deposition; superconducting thin films; superconducting transition temperature; yttrium compounds; 77 K; 90 K; DC magnetron sputtering; DC voltage; YBCO thin films; YBaCuO; critical temperature; gas pressure; magnet configurations; magnetron sputtering gun structure; on-axis geometry; substrate temperature; superconducting critical current; transition width; Argon; Geometry; Physics; Semiconductor thin films; Sputtering; Substrates; Superconducting magnets; Superconducting thin films; Voltage; Yttrium barium copper oxide;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.402860
Filename :
402860
Link To Document :
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