DocumentCode :
858141
Title :
The Cornell Electron Beam Ion Source
Author :
Kostroun, V.O. ; Ghanbari, E. ; Beebe, E.N. ; Janson, S.W.
Author_Institution :
Nuclear Science and Engineering Program, Ward Laboratory Cornell University, Ithaca, New York 14853
Volume :
28
Issue :
3
fYear :
1981
fDate :
6/1/1981 12:00:00 AM
Firstpage :
2660
Lastpage :
2662
Abstract :
An electron beam ion source (EBIS) for the production of low energy, multiply charged ion beams to be used in atomic physics experiments has been designed and constructed. An external high perveance electron gun is used to launch the electron beam into a conventional solenoid. Novel features of the design include a distributed sputter ion pump to create the ultrahigh vacuum environment in the ionization region of the source and microprocessor control of the axial trap voltage supplies.
Keywords :
Atomic beams; Electron beams; Ion beams; Ion sources; Ionization; Microprocessors; Physics; Production; Solenoids; Voltage control;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1981.4331789
Filename :
4331789
Link To Document :
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