DocumentCode :
859333
Title :
Microfabrication of Magnetic Tunnel Junctions Using CH 
OH Etching
Author :
Otani, Y. ; Kubota, H. ; Fukushima, A. ; Maehara, H. ; Osada, T. ; Yuasa, S. ; Ando, K.
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. & Technol.
Volume :
43
Issue :
6
fYear :
2007
fDate :
6/1/2007 12:00:00 AM
Firstpage :
2776
Lastpage :
2778
Abstract :
The 100-nm-scale CoFeB/MgO/CoFeB magnetic tunnel junctions (MTJs) were fabricated using a CH3OH etching process. These MTJs have steep side walls and show clear MR loops. The distributions of magnetic properties of CH3OH etched MTJs were smaller than those of conventional Ar ion etched MTJs
Keywords :
boron alloys; cobalt alloys; etching; ferromagnetic materials; iron alloys; magnesium compounds; magnetic multilayers; magnetic storage; magnetic thin film devices; magnetic thin films; magnetic tunnelling; magnetoresistance; random-access storage; CoFeB-MgO-CoFeB; etching process; magnetic properties; magnetic tunnel junctions; magnetoresistance loops; microfabrication; Amorphous magnetic materials; Argon; Etching; Magnetic devices; Magnetic films; Magnetic materials; Magnetic properties; Magnetic tunneling; Magnetoelectronics; Shape control; Etching; magnetic devices; magnetic films; magnetic memories; tunneling;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2007.894016
Filename :
4202760
Link To Document :
