DocumentCode :
859567
Title :
Improved current gain in bipolar transistor with bandgap narrowing in base
Author :
Sugii, Toshihiro ; Yamazaki, Tsutomu ; Ito, Takao
Author_Institution :
Fujitsu Labs. Ltd., Atsugi, Japan
Volume :
25
Issue :
1
fYear :
1989
Firstpage :
60
Lastpage :
61
Abstract :
Bandgap narrowing in a base was utilised to improve the current gain of the Si bipolar transistor. It enhances the injection of emitter current into the base. A transistor the authors fabricated with a base doping concentration of 2*1019/cm3 showed a bandgap narrowing of about 90 meV that enables about 25 times more collector current to flow than where there is now narrowing. Bandgap narrowing enables the fabrication of a transistor with a very thin base, enough current gain and moderate base resistance.
Keywords :
bipolar transistors; elemental semiconductors; semiconductor technology; silicon; Si bipolar transistor; bandgap narrowing in base; base doping concentration; current gain; down sizing; epitaxially grown base transistor; injection of emitter current; moderate base resistance; scaling; semiconductors; very thin base;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19890043
Filename :
19670
Link To Document :
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