• DocumentCode
    859675
  • Title

    The plasma in high-current pseudospark switches

  • Author

    Görtler, A. ; Frank ; Insam ; Prucker ; Schwandner, A. ; Tkotz, R. ; Christiansen, J. ; Hoffman, D.H.H.

  • Author_Institution
    Dept. of Phys., Erlangen-Nurnberg Univ., Germany
  • Volume
    24
  • Issue
    1
  • fYear
    1996
  • fDate
    2/1/1996 12:00:00 AM
  • Firstpage
    51
  • Lastpage
    52
  • Abstract
    The discharge behavior and the erosion rate of pseudospark switches for high currents (50-150 kA) and pulse lengths of several microseconds were investigated for different electrode materials. A capacitor discharge (3.3 μF) without any load was used at a maximum voltage of 30 kV. Side-on optical investigations were performed either with a streak camera or a fast shutter camera. Using metal electrodes, the discharge ignites on axis, then widens up radially and burns homogeneously at the edge of the central apertures. After about 500 ns, a stable anode spot is observed on the plane electrode surface (at currents exceeding 45 kA), the location of which is statistical. The discharge is transformed to a metal vapor are discharge and the erosion rate increases by more than one order of magnitude. With semiconductor electrodes (i.e., silicon carbide), a different discharge behavior is observed, After ignition on axis, the discharge burns homogeneously on the whole carbide surface. No contraction to a small area occurs in comparison to metal electrodes. The reignition of later current half cycles starts at the triple point metal-carbide-gas. Then the discharge again spreads homogeneously over the total carbide surface. The erosion rate is about two magnitudes lower in comparison to metals. We assume that the current is conducted in a thin surface sheath which is heated to more than 2000 K
  • Keywords
    plasma devices; plasma sheaths; plasma switches; pulsed power switches; sparks; switchgear; wear; 2000 K; 3.3 muF; 30 kV; 50 to 150 kA; SiC; burning discharge; capacitor discharge; discharge behavior; erosion rate; fast shutter camera; high-current pseudospark switches; metal electrodes; metal vapor; microsecond pulse lengths; plasma; semiconductor electrodes; side-on optical investigations; streak camera; thin surface sheath; Cameras; Capacitors; Electrodes; Fault location; Optical materials; Optical pulses; Optical switches; Plasma materials processing; Surface discharges; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.491686
  • Filename
    491686