• DocumentCode
    859726
  • Title

    A quasi-matrix ferroelectric memory for future silicon storage

  • Author

    Nishihara, Toshiyuki ; Ito, Yasuyuki

  • Author_Institution
    Sony Corp., Kanagawa, Japan
  • Volume
    37
  • Issue
    11
  • fYear
    2002
  • fDate
    11/1/2002 12:00:00 AM
  • Firstpage
    1479
  • Lastpage
    1484
  • Abstract
    We proposed a new quasi-matrix ferroelectric memory for use in future silicon-storage media. The memory unit consists of multiple ferroelectric capacitors and one access transistor. Each capacitor stores 1 bit of data, and the access transistor is shared by several capacitors. Compared with conventional crosspoint matrix type FeRAMs, which cause a signal degradation by read/write disturbance, this memory limits the disturbing frequency to an acceptable level by accessing the memory unit as a whole. Crosstalk noise was also minimized by applying a unique access scheme. This memory has a scalability by adopting built-in sense circuits, and enables an extremely high packing density with three-dimensional multistacking structures of memory cells.
  • Keywords
    ferroelectric capacitors; ferroelectric storage; integrated memory circuits; random-access storage; silicon; 3D multistacking structures; FeRAMs; Si; Si storage media; access scheme; access transistor; built-in sense circuits; crosstalk noise minimization; disturbing frequency; ferroelectric RAM; high packing density; memory cells; memory unit; multiple ferroelectric capacitors; quasi-matrix ferroelectric memory; scalability; Capacitors; Crosstalk; Degradation; Ferroelectric films; Ferroelectric materials; Frequency; Nonvolatile memory; Random access memory; Read-write memory; Silicon;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.2002.802358
  • Filename
    1046092