DocumentCode :
859726
Title :
A quasi-matrix ferroelectric memory for future silicon storage
Author :
Nishihara, Toshiyuki ; Ito, Yasuyuki
Author_Institution :
Sony Corp., Kanagawa, Japan
Volume :
37
Issue :
11
fYear :
2002
fDate :
11/1/2002 12:00:00 AM
Firstpage :
1479
Lastpage :
1484
Abstract :
We proposed a new quasi-matrix ferroelectric memory for use in future silicon-storage media. The memory unit consists of multiple ferroelectric capacitors and one access transistor. Each capacitor stores 1 bit of data, and the access transistor is shared by several capacitors. Compared with conventional crosspoint matrix type FeRAMs, which cause a signal degradation by read/write disturbance, this memory limits the disturbing frequency to an acceptable level by accessing the memory unit as a whole. Crosstalk noise was also minimized by applying a unique access scheme. This memory has a scalability by adopting built-in sense circuits, and enables an extremely high packing density with three-dimensional multistacking structures of memory cells.
Keywords :
ferroelectric capacitors; ferroelectric storage; integrated memory circuits; random-access storage; silicon; 3D multistacking structures; FeRAMs; Si; Si storage media; access scheme; access transistor; built-in sense circuits; crosstalk noise minimization; disturbing frequency; ferroelectric RAM; high packing density; memory cells; memory unit; multiple ferroelectric capacitors; quasi-matrix ferroelectric memory; scalability; Capacitors; Crosstalk; Degradation; Ferroelectric films; Ferroelectric materials; Frequency; Nonvolatile memory; Random access memory; Read-write memory; Silicon;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.2002.802358
Filename :
1046092
Link To Document :
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