DocumentCode :
860005
Title :
Planar heterojunction bipolar transistor with an implanted base
Author :
Yang, James Y. ; White, W.A.
Author_Institution :
Texas Instrum., Central Res. Labs., Dallas, TX, USA
Volume :
25
Issue :
4
fYear :
1989
Firstpage :
282
Lastpage :
283
Abstract :
A novel process to fabricate a planar emitter-up AlGaAs-GaAs heterojunction bipolar transistor HBT, has been developed relying on selective base implantation through the emitter and the heterojunction. The selective base definition means that all three transistor contacts can be made from the top surface, thereby making device integration easier because of the planar surface topology. This simple transistor fabrication process was examined using MOCVD material. Transistors with a DC current gain of 120 have been measured.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; ion implantation; vapour phase epitaxial growth; AlGaAs-GaAs; DC current gain; III-V semiconductors; MOCVD material; fabrication process; heterojunction bipolar transistor; implanted base; planar emitter-up HBT; planar surface topology; selective base implantation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19890196
Filename :
19713
Link To Document :
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