Title :
Simulation images from a low-pressure chlorine plasma reactor using DSMC
Author :
Johannes, J. ; Bartel, T.J. ; Economou, D.J. ; Lymberopoulos, D.P. ; Wise, R.S.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
fDate :
2/1/1996 12:00:00 AM
Abstract :
Modeling of high-density chemically reacting plasmas at low pressures (<10 mtorr) is of interest to the microelectronics industry for improving tool and process designs. High-density plasma simulations were performed using a fluids code to predict electron behavior, coupled to a direct simulation Monte Carlo (DSMC) program for neutral and ion transport. Images presented are for a chlorine plasma simulation at 10 mtorr and include the temperature difference between neutral species, depicting the nonthermal equilibrium nature of the plasma, and angular and energy distributions of ions and neutrals to the wafer surface
Keywords :
Monte Carlo methods; chemical reactions; chlorine; plasma devices; plasma diagnostics; plasma simulation; plasma transport processes; 10 mtorr; Cl2; angular distributions; direct simulation Monte Carlo; electron behavior; energy distributions; fluids code; high-density chemically reacting plasmas; high-density plasma simulations; ion transport; low pressures; low-pressure Cl2 plasma reactor; microelectronics industry; modeling; neutral transport; nonthermal equilibrium nature; process design; simulation images; tool design; wafer surface; Chemical industry; Chemical processes; Inductors; Microelectronics; Plasma applications; Plasma chemistry; Plasma simulation; Plasma temperature; Plasma transport processes; Process design;
Journal_Title :
Plasma Science, IEEE Transactions on
