Title :
Ion density and temperature distributions in an inductively coupled high-plasma density reactor
Author :
Lymberopoulos, Dimitris P. ; Wise, Richard S. ; Economou, Demetre J. ; Bartel, Timothy J.
Author_Institution :
Dept. of Chem. Eng., Houston Univ., TX, USA
fDate :
2/1/1996 12:00:00 AM
Abstract :
In a low-pressure plasma, the ion temperature Ti is comparable to the gas temperature Tg in regions of weak electric fields, but Ti can be more than an order of magnitude higher than Tg near the plasma sheath
Keywords :
ion density; plasma density; plasma devices; plasma diagnostics; plasma sheaths; plasma temperature; temperature; temperature distribution; inductively coupled high-plasma density reactor; ion density; ion temperature; low-pressure plasma; plasma sheath; weak electric fields; Coils; Inductors; Laboratories; Plasma applications; Plasma chemistry; Plasma density; Plasma materials processing; Plasma sheaths; Plasma temperature; Temperature distribution;
Journal_Title :
Plasma Science, IEEE Transactions on
