DocumentCode :
861562
Title :
An Intense Pulsed Barium Ion Source
Author :
Neri, J.M. ; Hammer, D.A. ; Baglin, J.E.E. ; Hodgson, R.T.
Author_Institution :
Laboratory of Plasma Studies, Cornell University, Ithaca, New York 14853
Volume :
28
Issue :
3
fYear :
1981
fDate :
6/1/1981 12:00:00 AM
Firstpage :
3378
Lastpage :
3379
Abstract :
A magnetically insulated diode has been used to produce 30 A/cm2, 250 keV, Ba+ion pulses for 170-200 nsec, using BaF2 as the ion source material. Other operating conditions yield pulse of Ba+ and F+ ions at 300 keV and Ba+2ions at 600 keV. The beam is diagnosed with time-of-flight analysis, Secondary Ion Mass Spectioscopy, and Rutherford backscattering of 2.3 MeV helium ions.
Keywords :
Anodes; Barium; Current density; Insulation; Ion beams; Ion sources; Magnetic analysis; Particle beams; Semiconductor diodes; Voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1981.4332109
Filename :
4332109
Link To Document :
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