• DocumentCode
    861562
  • Title

    An Intense Pulsed Barium Ion Source

  • Author

    Neri, J.M. ; Hammer, D.A. ; Baglin, J.E.E. ; Hodgson, R.T.

  • Author_Institution
    Laboratory of Plasma Studies, Cornell University, Ithaca, New York 14853
  • Volume
    28
  • Issue
    3
  • fYear
    1981
  • fDate
    6/1/1981 12:00:00 AM
  • Firstpage
    3378
  • Lastpage
    3379
  • Abstract
    A magnetically insulated diode has been used to produce 30 A/cm2, 250 keV, Ba+ion pulses for 170-200 nsec, using BaF2 as the ion source material. Other operating conditions yield pulse of Ba+ and F+ ions at 300 keV and Ba+2ions at 600 keV. The beam is diagnosed with time-of-flight analysis, Secondary Ion Mass Spectioscopy, and Rutherford backscattering of 2.3 MeV helium ions.
  • Keywords
    Anodes; Barium; Current density; Insulation; Ion beams; Ion sources; Magnetic analysis; Particle beams; Semiconductor diodes; Voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1981.4332109
  • Filename
    4332109
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=861562