• DocumentCode
    861963
  • Title

    Thermal stability of GaAs MESFETs fabricated using only spin-on metal sources

  • Author

    Prasad, K.

  • Author_Institution
    Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ.
  • Volume
    32
  • Issue
    7
  • fYear
    1996
  • fDate
    3/28/1996 12:00:00 AM
  • Firstpage
    695
  • Lastpage
    697
  • Abstract
    GaAs MESFETs were fabricated using spin-on platinum as the gate material and spin-on tin-silica as the source and drain material. They were subsequently aged at elevated temperatures (200, 300, and 400°C) for durations up to 1000 h. DC electrical characterisation of the MESFETs was carried out during various stages of annealing. The results show that the MESFETs fabricated using spin-on metal sources have acceptable electrical characteristics. The progressive degradation in the electrical parameters of the MESFET is described in terms of the degradation of the ohmic and the Schottky contacts. The room temperature (300 K) operating life of GaAs MESFETs, based on a failure criterion of a 20% decrease in the transconductance gm, is found to be 10 6 h
  • Keywords
    III-V semiconductors; Schottky barriers; Schottky gate field effect transistors; ageing; failure analysis; gallium arsenide; ohmic contacts; semiconductor device metallisation; semiconductor device reliability; 1000 h; 200 to 400 degC; 300 K; DC electrical characterisation; GaAs; MESFETs; Schottky contacts; ageing; drain material; failure criterion; gate material; ohmic contacts; room temperature operating life; source material; spin-on metal sources; transconductance;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19960421
  • Filename
    491908