DocumentCode :
861963
Title :
Thermal stability of GaAs MESFETs fabricated using only spin-on metal sources
Author :
Prasad, K.
Author_Institution :
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ.
Volume :
32
Issue :
7
fYear :
1996
fDate :
3/28/1996 12:00:00 AM
Firstpage :
695
Lastpage :
697
Abstract :
GaAs MESFETs were fabricated using spin-on platinum as the gate material and spin-on tin-silica as the source and drain material. They were subsequently aged at elevated temperatures (200, 300, and 400°C) for durations up to 1000 h. DC electrical characterisation of the MESFETs was carried out during various stages of annealing. The results show that the MESFETs fabricated using spin-on metal sources have acceptable electrical characteristics. The progressive degradation in the electrical parameters of the MESFET is described in terms of the degradation of the ohmic and the Schottky contacts. The room temperature (300 K) operating life of GaAs MESFETs, based on a failure criterion of a 20% decrease in the transconductance gm, is found to be 10 6 h
Keywords :
III-V semiconductors; Schottky barriers; Schottky gate field effect transistors; ageing; failure analysis; gallium arsenide; ohmic contacts; semiconductor device metallisation; semiconductor device reliability; 1000 h; 200 to 400 degC; 300 K; DC electrical characterisation; GaAs; MESFETs; Schottky contacts; ageing; drain material; failure criterion; gate material; ohmic contacts; room temperature operating life; source material; spin-on metal sources; transconductance;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19960421
Filename :
491908
Link To Document :
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