DocumentCode
861963
Title
Thermal stability of GaAs MESFETs fabricated using only spin-on metal sources
Author
Prasad, K.
Author_Institution
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ.
Volume
32
Issue
7
fYear
1996
fDate
3/28/1996 12:00:00 AM
Firstpage
695
Lastpage
697
Abstract
GaAs MESFETs were fabricated using spin-on platinum as the gate material and spin-on tin-silica as the source and drain material. They were subsequently aged at elevated temperatures (200, 300, and 400°C) for durations up to 1000 h. DC electrical characterisation of the MESFETs was carried out during various stages of annealing. The results show that the MESFETs fabricated using spin-on metal sources have acceptable electrical characteristics. The progressive degradation in the electrical parameters of the MESFET is described in terms of the degradation of the ohmic and the Schottky contacts. The room temperature (300 K) operating life of GaAs MESFETs, based on a failure criterion of a 20% decrease in the transconductance gm, is found to be 10 6 h
Keywords
III-V semiconductors; Schottky barriers; Schottky gate field effect transistors; ageing; failure analysis; gallium arsenide; ohmic contacts; semiconductor device metallisation; semiconductor device reliability; 1000 h; 200 to 400 degC; 300 K; DC electrical characterisation; GaAs; MESFETs; Schottky contacts; ageing; drain material; failure criterion; gate material; ohmic contacts; room temperature operating life; source material; spin-on metal sources; transconductance;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19960421
Filename
491908
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