Title :
Comparative Study on Magnetoimpedance Effect in Laminating FeAlN Films With Nonferromagnetic and Ferromagnetic Layer
Author :
Zhong, Zhiyong ; Zhang, Huaiwu ; Jing, Yulan ; Tang, Xiaoli ; Liu, Shuang
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu
fDate :
6/1/2007 12:00:00 AM
Abstract :
The laminating [FeAlN (50 nm)/NiFe or Cu (10 nm)]20 films were fabricated by magnetron sputtering method and the magnetoimpedance (MI) ratio of these films was measured. Results show that the MI ratio of the laminating FeAlN film with ferromagnetic Permalloy layer is enhanced by 50% more than that with nonferromagnetic copper. The enhancement of MI ratio is explained by exchange induced ripple reduction mechanism
Keywords :
Permalloy; aluminium compounds; copper; exchange interactions (electron); ferromagnetic materials; iron compounds; laminations; magnetic anisotropy; magnetic thin films; magnetoresistance; sputter deposition; FeAlN-Cu; FeAlN-NiFe; exchange induced ripple reduction mechanism; ferromagnetic Permalloy layer; laminating films; magnetoimpedance effect; magnetron sputtering method; nonferromagnetic copper; Conductivity; Fabrication; Magnetic anisotropy; Magnetic domains; Magnetic field measurement; Magnetic films; Perpendicular magnetic anisotropy; Saturation magnetization; Soft magnetic materials; Sputtering; Magnetic anisotropy; magnetic field effects; magnetic films; magnetoimpedance;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2007.893710
