Comparison of simulation and experiment for a Josephson fluxonic diode

With a slight modification to the control line and its bias configuration, a long Josephson junction vortex flow transistor structure can become a so-called fluxonic diode containing fluxon and antifluxon "doped" regions in analogy to a pn junction. Such structures have been made with Nb-Pb tunnel junctions allowing testing of the same device with a number of different doping configurations. This paper compares experimental results with a one dimensional numerical simulation. Different configurations for the diode have been modeled with Stewart-McCumber loss parameters ranging between 50 and 1400. The simulation clarifies the origin of a number of experimental observations, including a peculiar dependence of resonance induced step behavior on loss parameter, and a limit to the value of the gradient of doping in the transition region below which an asymmetric I-V curve representing forward and reverse biases is obtained. In forward bias, the I-V curve above a threshold current is roughly linear and devoid of resonance structure, provided injection of carriers occurs from one region to the other. Injection is a function of loss and the asymmetry of doping.<>