Title :
Two-dimensional GaAs photonic switch array with direct gain and high contrast
Author_Institution :
Matsushita Electric Ind. Co. Ltd., Osaka, Japan
fDate :
2/1/1993 12:00:00 AM
Abstract :
The fabrication and design of a 4×4 surface-normal reflection photonic switch array, with an operating principle based on the change of the gain coefficient in GaAs, is described. A 3-μm-thick GaAs active layer and carrier confinement layers are sandwiched between a semiconductor multilayer reflector and an antireflection window. The beryllium ion implantation technique is used to make a narrow current path to reduce the operation current. Each photonic switch independently realizes direct amplification and absorption of the optical signal. It features an optical gain of 4 dB and a contrast of 9.6 dB, for an applied voltage of 2.2 V. The array has a simple planar structure
Keywords :
III-V semiconductors; electro-optical devices; gallium arsenide; integrated optics; optical switches; semiconductor switches; 2.2 V; 2D array; 3 micron; 4 dB; 4×4 surface-normal reflection photonic switch array; Be ion implantation; GaAs active layer; GaAs:Be; III-V semiconductor; antireflection window; carrier confinement layers; design; direct amplification; direct gain; fabrication; gain coefficient; high contrast; integration; modulator; narrow current path; operation current; optical gain; optical signal absorption; semiconductor multilayer reflector; simple planar structure; Carrier confinement; Fabrication; Gallium arsenide; Ion implantation; Nonhomogeneous media; Optical arrays; Optical reflection; Particle beam optics; Stimulated emission; Switches;
Journal_Title :
Quantum Electronics, IEEE Journal of