Title :
Precise Analytical Model for Short-Channel Quadruple-Gate Gate-All-Around MOSFET
Author :
Sharma, Divya ; Vishvakarma, Santosh Kumar
Author_Institution :
Nanoscale Devices, VLSI/ULSI Circuit & Syst. Design Lab., Indian Inst. of Technol., Indore, Indore, India
Abstract :
A compact analytical model is presented for crossover point, subthreshold slope, virtual cathode position, and threshold voltage for a short-channel quadruple-gate (QuaG) gate-all-around (GAA) MOSFET. The potential distribution in the channel is obtained by an analytical solution of 3-D Poisson´s equation, where the electron quasi-Fermi level is approximated to be zero for low drain-to-source voltages. Using isomorphic polynomial function for potential distribution, we have analyzed, for the first time, the crossover point for the QuaG GAA MOSFET. Further, the modeled subthreshold slope for lightly doped QuaG GAA MOSFET has been improved by introducing z-dependent characteristic length, and the position of minimum center potential in the channel is obtained by virtual cathode position. A model is proposed for threshold voltage, based on shifting of the inversion charge from center line to silicon-insulator interface.
Keywords :
Fermi level; MOSFET; Poisson equation; cathodes; elemental semiconductors; insulators; polynomials; silicon; 3D Poisson equation; Si; crossover point; drain-to-source voltages; electron quasiFermi level; inversion charge; isomorphic polynomial function; lightly doped QuaG GAA MOSFET; minimum center potential position; modeled subthreshold slope; potential distribution; precise analytical model; short-channel quadruple-gate gate-all- around MOSFET; short-channel quadruple-gate gate-all-around MOSFET; silicon-insulator interface; subthreshold slope; threshold voltage model; virtual cathode position; z-dependent characteristic length; Cathodes; Electric potential; Logic gates; MOSFET circuits; Semiconductor device modeling; Silicon; Threshold voltage; Crossover point; subthreshold slope; threshold voltage; virtual cathode position;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2013.2251895