DocumentCode :
86471
Title :
Orientational Dependence in Device Performances of InAs and Si Nanowire MOSFETs Under Ballistic Transport
Author :
Shimoida, K. ; Yamada, Y. ; Tsuchiya, H. ; Ogawa, M.
Author_Institution :
Dept. of Electr. & Electron. Eng., Kobe Univ., Kobe, Japan
Volume :
60
Issue :
1
fYear :
2013
fDate :
Jan. 2013
Firstpage :
117
Lastpage :
122
Abstract :
We evaluate drive currents and consumption powers of InAs and Si nanowire metal-oxide-semiconductor field-effect transistors (MOSFETs) with various crystal orientations, by using a ballistic MOSFET model coupled with tight-binding band structure calculation. We demonstrate that performance dependence on the wire orientation is not significant in InAs NWFETs compared to Si NWFETs, due to an isotropic nature of the Γ valley, and furthermore, a lower power switching is expected in InAs NWFETs even if the gate oxide thickness reduces down to a quantum capacitance limit. The present results suggest that InAs NWFETs have the advantage over the Si counterpart in terms of lower power operation and flexibility in layout design of integrated circuits.
Keywords :
III-V semiconductors; MOSFET; ballistic transport; crystal orientation; elemental semiconductors; indium compounds; nanowires; silicon; tight-binding calculations; InAs; NWFET; Si; ballistic MOSFET model; ballistic transport; consumption power; crystal orientation; device performance; drive current; gate oxide thickness; integrated circuit; isotropic nature; layout design; nanowire MOSFET; nanowire metal-oxide-semiconductor field-effect transistor; orientational dependence; quantum capacitance limit; tight-binding band structure calculation; wire orientation; Logic gates; MOSFETs; Performance evaluation; Quantum capacitance; Silicon; Switches; Ballistic transport; current drive; high-mobility semiconductors; nanowire (NW) transistors; power delay product (PDP); quantum capacitance (QC); tight-binding (TB) approach;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2012.2228199
Filename :
6375803
Link To Document :
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