مرکز منطقه ای اطلاع رساني علوم و فناوري - Measurememt of depth distribution of phosphorus in films of phosphosilicate glass by means of <sup>31</sup>p(p,α)<sup>28</sup>Si

DocumentCode :

865677

Title :

Measurememt of depth distribution of phosphorus in films of phosphosilicate glass by means of ³¹p(p,α)²⁸Si

Author :

Norbeck, E. ; Ma, T.Z.

Author_Institution :

Department of Physics and Astronomy the University of Iowa Iowa City, Iowa 52242

Volume :

Issue :

fYear :

1983

fDate :

4/1/1983 12:00:00 AM

Firstpage :

1347

Lastpage :

1348

Abstract :

Phosphorus concentrations of a few percent are studied as a function of depth in 1 μm thick films of phosphosilicate glass on silicon using the ³¹p(p,α)²⁸Si reaction. The proton energy is 5.325 MeV. The a particles are detected at 170°. The depth resolution is better than 0.05 μm.

Keywords :

Astronomy; Atomic measurements; Detectors; Extraterrestrial measurements; Glass; Optical scattering; Physics; Protons; Pulse circuits; Silicon;

fLanguage :

English

Journal_Title :

Nuclear Science, IEEE Transactions on

Publisher :

ieee

ISSN :

0018-9499

Type :

jour

DOI :

10.1109/TNS.1983.4332528

Filename :

4332528

Link To Document :

https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=865677