DocumentCode :
865865
Title :
Fabrication process for high track density yoke MR heads
Author :
Yamada, Kazuhiko ; Mukainaru, Masahito ; Urai, Haruo ; Matsutera, Hisao
Author_Institution :
NEC Corp., Kawasaki, Japan
Volume :
26
Issue :
5
fYear :
1990
fDate :
9/1/1990 12:00:00 AM
Firstpage :
2406
Lastpage :
2408
Abstract :
A fabrication process was developed for a high track density yoke MR (magnetoresistive) head whose track width is determined by its front yoke thickness. The fabrication process, involving planarized front yoke formation, consists of the deposition process for a grooved yoke pattern with vertical side wall and a subsequent etch-back process with polystyrene polymer. Extraordinary recessed patterns, 3.5-μm deep, were almost completely planarized to less than 0.1 μm using these processes. Fabricated pattern-evaluation results indicate that CoZr system films are more suitable for use as a yoke material than NiFe films. Microstructure analyses reveal that the degradation in fabricated NiFe patterns is related to the structural change at the region near the grooved pattern side wall
Keywords :
cobalt alloys; etching; iron alloys; magnetic heads; magnetic recording; magnetic thin film devices; magnetic thin films; nickel alloys; zirconium alloys; CoZr films; NiFe films; deposition process; etch-back process; fabrication process; front yoke thickness; grooved yoke pattern; high track density yoke MR heads; magnetoresistive heads; microstructure; pattern-evaluation; planarized front yoke formation; polystyrene polymer; recessed patterns; structural change; track width; vertical side wall; Amorphous magnetic materials; Fabrication; Magnetic films; Magnetic flux; Magnetic heads; Magnetic materials; Magnetic sensors; Polymers; Sputter etching; Substrates;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.104746
Filename :
104746
Link To Document :
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