• DocumentCode
    865945
  • Title

    Study of injection effects on BSF silicon solar cells

  • Author

    Cid, Manuel ; Ruiz, Jose M.

  • Author_Institution
    Inst. de Solar Eng., Polytech. Univ. of Madrid, Spain
  • Volume
    36
  • Issue
    3
  • fYear
    1989
  • fDate
    3/1/1989 12:00:00 AM
  • Firstpage
    507
  • Lastpage
    513
  • Abstract
    The behavior of p+-n-n+ and n+-p-p+ silicon solar cells in terms of short-circuit current, open-circuit voltage, fill factor, and efficiency is studied as a function of base doping and illumination levels. A theoretical model that is valid for any injection level in the base region is used. Experimental results for cells of n-type base (in the range of 0.3 to 1000 Ω-cm) and a p-type base (0.4 to 300 Ω-cm) are presented. The theoretical model is able to explain phenomena such as the superlinearity of Isc with concentration and the degradation of short-circuit current and efficiency at very high concentrations. These effects are seen as connected with the ohmic electric field in the base region. For the emitter saturation currents considered here, it can be concluded that, for p-type substrates, low base resistivities (≅1 Ω-cm) are necessary to achieve high efficiencies under concentrated light (≅100 suns), while for flat-array cells a particular resistivity is not required. For n-type substrates, it is found that any resistivity level can be used for both flat-array and concentrator cells
  • Keywords
    elemental semiconductors; semiconductor device models; silicon; solar cells; 0.4 to 1000 ohmcm; Si; back-surface-field solar cells; base doping; base resistivities; concentrated light; concentrator cells; efficiency; emitter saturation currents; fill factor; flat-array cells; high concentrations; illumination levels; injection effects; n-type substrates; ohmic electric field; open-circuit voltage; p-type substrates; short-circuit current; superlinearity; theoretical model; Circuits; Conductivity; Degradation; Doping; Equations; Photovoltaic cells; Semiconductor process modeling; Silicon; Substrates; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.19961
  • Filename
    19961