DocumentCode
865945
Title
Study of injection effects on BSF silicon solar cells
Author
Cid, Manuel ; Ruiz, Jose M.
Author_Institution
Inst. de Solar Eng., Polytech. Univ. of Madrid, Spain
Volume
36
Issue
3
fYear
1989
fDate
3/1/1989 12:00:00 AM
Firstpage
507
Lastpage
513
Abstract
The behavior of p+-n-n+ and n+-p-p+ silicon solar cells in terms of short-circuit current, open-circuit voltage, fill factor, and efficiency is studied as a function of base doping and illumination levels. A theoretical model that is valid for any injection level in the base region is used. Experimental results for cells of n-type base (in the range of 0.3 to 1000 Ω-cm) and a p-type base (0.4 to 300 Ω-cm) are presented. The theoretical model is able to explain phenomena such as the superlinearity of I sc with concentration and the degradation of short-circuit current and efficiency at very high concentrations. These effects are seen as connected with the ohmic electric field in the base region. For the emitter saturation currents considered here, it can be concluded that, for p-type substrates, low base resistivities (≅1 Ω-cm) are necessary to achieve high efficiencies under concentrated light (≅100 suns), while for flat-array cells a particular resistivity is not required. For n-type substrates, it is found that any resistivity level can be used for both flat-array and concentrator cells
Keywords
elemental semiconductors; semiconductor device models; silicon; solar cells; 0.4 to 1000 ohmcm; Si; back-surface-field solar cells; base doping; base resistivities; concentrated light; concentrator cells; efficiency; emitter saturation currents; fill factor; flat-array cells; high concentrations; illumination levels; injection effects; n-type substrates; ohmic electric field; open-circuit voltage; p-type substrates; short-circuit current; superlinearity; theoretical model; Circuits; Conductivity; Degradation; Doping; Equations; Photovoltaic cells; Semiconductor process modeling; Silicon; Substrates; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.19961
Filename
19961
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