DocumentCode :
866380
Title :
Performance advantages of 3-D digital integrated circuits in a mixed SOI and bulk CMOS design space
Author :
Liu, Christianto C. ; Tiwari, Sandip
Author_Institution :
Cornell Univ., Ithaca, NY, USA
Volume :
53
Issue :
3
fYear :
2006
fDate :
3/1/2006 12:00:00 AM
Firstpage :
207
Lastpage :
211
Abstract :
Three-dimensional (3-D) integrated circuits (ICs), with multiple stacked device layers, offer a unique design opportunity to use both bulk and partially depleted (PD) silicon-on-insulator (SOI) CMOS devices in a single circuit design. Such 3-D designs can, for example, minimize the body effect common in bulk designs and reduce adverse floating-body effects (FBE) common in PD SOI designs. Sequential 3-D technology such as exfoliation-based single-crystal silicon layer transfer allows a low-temperature approach to 3-D integration with high-density interconnectivity. Using the characteristics of this technology, we present the mixed SOI bulk (MSB) design approach that effectively re-maps conventional VLSI designs to the 3-D design space. Tradeoffs in delay, noise margin, power, and circuit footprint are analyzed and demonstrated through analyzes of static, dynamic, pass-transistor, and SRAM circuits.
Keywords :
CMOS digital integrated circuits; circuit optimisation; digital integrated circuits; silicon-on-insulator; 3D SRAM; 3D digital integrated circuits; VLSI designs; bulk CMOS design space; bulk silicon-on-insulator CMOS device; circuit optimization; floating-body effects; high-density interconnectivity; mixed SOI; multiple stacked device layers; partially depleted silicon-on-insulator CMOS device; silicon-on-insulator technology; single-crystal silicon layer transfer; CMOS digital integrated circuits; CMOS integrated circuits; CMOS technology; Circuit synthesis; Delay; Digital integrated circuits; Integrated circuit interconnections; Silicon on insulator technology; Space technology; Very large scale integration; 3-D SRAM; 3-D integration; Circuit optimization; integrated circuit (IC) technology; silicon-on-insulator (SOI) technology; three-dimensional (3-D) ICs;
fLanguage :
English
Journal_Title :
Circuits and Systems II: Express Briefs, IEEE Transactions on
Publisher :
ieee
ISSN :
1549-7747
Type :
jour
DOI :
10.1109/TCSII.2005.857538
Filename :
1605435
Link To Document :
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