Skew scattering and side jump mechanisms in the Hall effect of amorphous NdFeB/FeB compositionally modulated multilayers

Author

Peral, G. ; Martinez, B. ; Vicent, J.L. ; Tejada, J.

Author_Institution

Dept. de Fisica de Mater., Univ. Complutense, Madrid, Spain

Volume

26

Issue

5

fYear

1990

fDate

9/1/1990 12:00:00 AM

Firstpage

2753

Lastpage

2755

Abstract

Hall-effect measurements have been performed in amorphous sputtered Nd₁₂Fe₈₀B₈ film and in amorphous sputtered Nd₂₆F₆₈B₆/Fe₉₂B₈ multilayers between 4.2 and 200 K with applied magnetic fields up to 7 T. The layered character of the samples has been tested by X-ray diffraction. The dependence of resistivity and saturation magnetization on layer thicknesses makes it possible to investigate the contribution of the different microscopic mechanisms to the Hall effect. The Hall-effect data show the typical behaviour of an itinerant ferromagnet with skew and side jump terms

Keywords

Hall effect; X-ray diffraction examination of materials; boron alloys; electrical conductivity of amorphous metals and alloys; ferromagnetic properties of substances; iron alloys; magnetic thin films; magnetisation; neodymium alloys; sputtered coatings; Hall effect; NdFeB-FeB multilayers; X-ray diffraction; amorphous sputtered films; applied magnetic fields; compositionally modulated multilayers; itinerant ferromagnet; layer thicknesses; microscopic mechanisms; resistivity; saturation magnetization; side jump mechanisms; skew scattering; Amorphous materials; Hall effect; Iron; Magnetic fields; Magnetic films; Magnetic multilayers; Neodymium; Performance evaluation; Testing; X-ray scattering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.104861

Filename

104861