DocumentCode
867824
Title
Development of a New Interposer Including Embedded Thin Film Passive Elements
Author
Mori, Toshiaki ; Yamaguchi, Masataka ; Kuramochi, Satoru ; Fukuoka, Yoshitaka
Author_Institution
Res. & Dev. Center, Dai Nippon Printing Comapny Ltd., Chiba
Volume
32
Issue
2
fYear
2009
fDate
5/1/2009 12:00:00 AM
Firstpage
503
Lastpage
508
Abstract
This paper reports the development of thin film passive elements embedded within the interlayer of a silicon interposer. Thin film resistors were developed using a seed layer formed by the sputter semi-additive method. Inductor coils were designed as spiral coils, using Benzocyclobutene as the dielectric interlayer, and thin film metal-insulator-metal capacitors were formed using an anodizing tantalum oxide thin film as the dielectric layer and tantalum conductor films as capacitor electrodes. In this study, the fabrication process and the high-frequency properties of these passive elements are investigated.
Keywords
anodisation; coils; low-pass filters; passive networks; silicon; thin film resistors; anodic oxidation; benzocyclobutene; dielectric interlayer; embedded thin film passive elements; inductor coils; low-pass filter; silicon interposer; spiral coils; sputter semi-additive method; thin film metal-insulator-metal capacitors; thin film resistors; Anodic oxidation; high-frequency characteristic; low-pass filter; passive circuit; thin film embedded passive elements;
fLanguage
English
Journal_Title
Advanced Packaging, IEEE Transactions on
Publisher
ieee
ISSN
1521-3323
Type
jour
DOI
10.1109/TADVP.2009.2014388
Filename
4926136
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