DocumentCode :
868087
Title :
Circuit-Level Impact of a-Si:H Thin-Film-Transistor Degradation Effects
Author :
Allee, David R. ; Clark, Lawrence T. ; Vogt, Bryan D. ; Shringarpure, Rahul ; Venugopal, Sameer M. ; Uppili, Shrinivas Gopalan ; Kaftanoglu, Korhan ; Shivalingaiah, Hemanth ; Li, Zi P. ; Fernando, J. J Ravindra ; Bawolek, Edward J. ; O´Rourke, Shawn M.
Author_Institution :
Flexible Display Center, Arizona State Univ., Tempe, AZ
Volume :
56
Issue :
6
fYear :
2009
fDate :
6/1/2009 12:00:00 AM
Firstpage :
1166
Lastpage :
1176
Abstract :
This paper reviews amorphous silicon thin-film-transistor (TFT) degradation with electrical stress, examining the implications for various types of circuitry. Experimental measurements on active-matrix backplanes, integrated a-Si:H column drivers, and a-Si:H digital circuitry are performed. Circuit modeling that enables the prediction of complex-circuit degradation is described. The similarity of degradation in amorphous silicon to negative bias temperature instability in crystalline PMOS FETs is discussed as well as approaches in reducing the TFT degradation effects. Experimental electrical-stress-induced degradation results in controlled humidity environments are also presented.
Keywords :
MOSFET; driver circuits; thin film transistors; active-matrix backplanes; amorphous silicon thin-film-transistor degradation; circuit modeling; circuit-level impact; column drivers; complex-circuit degradation; crystalline PMOS FET; digital circuitry; electrical-stress-induced degradation; negative bias temperature instability; Active matrix technology; Amorphous silicon; Backplanes; Degradation; Driver circuits; Integrated circuit measurements; Performance evaluation; Predictive models; Stress; Thin film transistors; Amorphous silicon; flexible electronics; thin-film transistors (TFTs); threshold-voltage shift;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2009.2019387
Filename :
4926162
Link To Document :
بازگشت