Title :
Operation of Pt/AlGaN/GaN-Heterojunction Field-Effect-Transistor Hydrogen Sensors With Low Detection Limit and High Sensitivity
Author :
Song, Junghui ; Lu, Wu
Author_Institution :
Dept. of Electr. & Comput. Eng., Ohio State Univ., Columbus, OH
Abstract :
To enhance the device sensitivity and detection limit, a gate bias is applied to the catalytic metal of AlGaN/GaN- heterojunction field-effect-transistor (HFET) hydrogen sensors to control the carrier concentration in the channel at operation. The sensors exhibit a good sensitivity at temperatures up to 800degC and a detection limit of 10-ppb H2 in N2. The dependence of the device sensitivity on gate and drain biases has been investigated. The sensitivity peaks at the gate bias of threshold voltage and the drain bias of knee voltage in sensing gas. At high temperatures and H2 concentrations, specifically from 300degC and 1000-ppm H2/N2, respectively, the sensitivity of HFETs at Vgs = -3.5 V and Vds = 1V is more than three orders higher than their sensitivity at Vgs = 0 V and the sensitivity of Schottky diodes.
Keywords :
III-V semiconductors; aluminium compounds; carrier density; gallium compounds; gas sensors; high electron mobility transistors; hydrogen; platinum; wide band gap semiconductors; H2; Pt-AlGaN-GaN; carrier concentration; catalytic metal; drain bias; gate bias; heterojunction field-effect-transistor; hydrogen sensors; knee voltage; sensitivity; temperature 300 degC; temperature 800 degC; threshold voltage; voltage -3.5 V; voltage 1 V; AlGaN/GaN; GaN; gas sensors; heterostructure field-effect transistors (HFETs);
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2008.2005432