Title :
Fabrication of integrated metallic MEMS devices
Author :
Yalçinkaya, A.D. ; Ravnkilde, J.T. ; Hansen, O.
Author_Institution :
Nat. Micro & Nanotechnology Res. Center, Lyngby, Denmark
fDate :
11/21/2002 12:00:00 AM
Abstract :
A simple and complementary metal oxide semiconductor (CMOS) compatible fabrication technique for microelectromechanical (MEMS) devices is presented. The fabrication technology makes use of electroplated metal layers. Among the fabricated devices, high quality factor microresonators are characterised with respect to the quality factor.
Keywords :
Q-factor; electroplated coatings; micromechanical devices; micromechanical resonators; CMOS wafer; electroplated metal layer; fabrication technology; integrated metallic MEMS device; microresonator; quality factor;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20021032
