DocumentCode :
868481
Title :
The Temperature Dependence of Mismatch in Deep-Submicrometer Bulk MOSFETs
Author :
Andricciola, Pietro ; Tuinhout, Hans P.
Author_Institution :
NXP Semicond., Eindhoven
Volume :
30
Issue :
6
fYear :
2009
fDate :
6/1/2009 12:00:00 AM
Firstpage :
690
Lastpage :
692
Abstract :
We present a study of the temperature dependence of transistor mismatch in a 65-nm CMOS platform over a temperature range of 0degC to 125degC. We show that the relative-drain-current-mismatch fluctuation properties improve marginally in strong inversion, while they are strongly affected in the subthreshold region. This is compared and explained with a commonly used model. Furthermore, we analyze the change over temperature of the ION mismatch of individual matched pairs. This analysis shows, for the first time, that although relative-current-mismatch fluctuation standard deviations estimated on whole populations are reduced at higher temperatures, the current mismatch of individual pairs can change substantially over temperature.
Keywords :
CMOS integrated circuits; MOSFET; temperature measurement; CMOS platform; deep-submicrometer bulk MOSFET; relative-drain-current-mismatch fluctuation; size 65 nm; temperature 0 degC to 125 degC; temperature dependence; transistor mismatch; CMOS; fluctuation sweep; mismatch; subthreshold region; temperature effect;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2020524
Filename :
4926201
Link To Document :
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