DocumentCode :
869926
Title :
X-Ray Irradiation and Bias Effects in Fully-Depleted and Partially-Depleted SiGe HBTs Fabricated on CMOS-Compatible SOI
Author :
Bellini, Marco ; Jun, Bongim ; Chen, Tianbing ; Cressler, John D. ; Marshall, Paul W. ; Chen, Dakai ; Schrimpf, Ronald D. ; Fleetwood, Daniel M. ; Cai, Jin
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA
Volume :
53
Issue :
6
fYear :
2006
Firstpage :
3182
Lastpage :
3186
Abstract :
X-ray total ionizing dose effects in both fully-depleted and partially-depleted SiGe HBT-on-SOI transistors are investigated at room and at cryogenic temperatures for the first time. Devices irradiated in grounded and forward-active mode configurations exhibit a different behavior depending on the collector doping of the device. The degradation produced by 10 keV x-rays is compared to previously reported 63 MeV proton results on the same fully-depleted SiGe HBT-on-SOI devices, showing decreased degradation for proton irradiation. Both collector and substrate bias are shown to affect the two-dimensional nature of the current flow in these devices, resulting in significant differences in the avalanche multiplication characteristics (hence, breakdown voltage) across temperature
Keywords :
X-ray effects; cryogenics; heterojunction bipolar transistors; semiconductor heterojunctions; silicon-on-insulator; 293 to 298 K; CMOS-compatible SOI; SiGe; TCAD; X-ray irradiation effects; X-ray total ionizing dose effects; avalanche multiplication characteristics; bias effects; breakdown voltage; collector doping; cryogenic temperatures; current flow; forward-active mode configurations; fully-depleted SiGe HBT; grounded configurations; heterojunction bipolar transistors; partially-depleted SiGe HBT; proton irradiation; silicon-on-insulator technology; substrate bias; CMOS technology; Cryogenics; Degradation; Germanium silicon alloys; Protons; Silicon germanium; Silicon on insulator technology; Space technology; Substrates; Temperature; Heterojunction bipolar transistors; SOI; SiGe HBT; TCAD; radiation effects; silicon-on-insulator technology;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2006.885795
Filename :
4033220
Link To Document :
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