DocumentCode
870346
Title
An analytical open-failure lifetime model for stress-induced voiding in aluminum lines
Author
Okabayashi, Hidekazu
Author_Institution
NEC Corp., Ibaraki, Japan
Volume
40
Issue
4
fYear
1993
fDate
4/1/1993 12:00:00 AM
Firstpage
782
Lastpage
788
Abstract
An analytical model is derived for determining the time before which LSI aluminum (Al) lines with a bamboo-grain structure undergo open failures caused by stress-induced voiding. Derivations are based on the following assumptions: that the driving force for void growth is relaxation of Al-line tensile stress, that the mass transport rate is proportional to the n th power of Al-line stress, and that the void will maintain its prism shape throughout its growth. The critical minimum initial tensile stress value for producing open failure is calculated, as are the respective dependencies of lifetime on void tip angle, temperature, line dimensions, and line tensile stress. By adjusting the values of certain parameters within the model, it is possible to derive temperature, line-dimension, and tensile-stress dependencies that fall within the range of experimentally obtained results
Keywords
aluminium; large scale integration; metallisation; reliability; Al metallisation; analytical model; bamboo-grain structure; critical minimum initial tensile stress; dependencies of lifetime; driving force for void growth; line dimensions; line tensile stress; mass transport rate; open failures; open-failure lifetime model; prism shape; stress-induced voiding; temperature; tensile stress relaxation; void tip angle; Aluminum; Analytical models; Artificial intelligence; Creep; Numerical models; Predictive models; Shape; Temperature dependence; Temperature distribution; Tensile stress;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.202791
Filename
202791
Link To Document