DocumentCode
870535
Title
1-ns high-power high-repetitive excimer laser oscillator
Author
Yamada, Kawakatsu ; Miyazaki, Kenzo ; Hasama, Toshifumi ; Sato, Takuzo
Author_Institution
Electrotech. Lab., Ibaraki, Japan
Volume
24
Issue
2
fYear
1988
Firstpage
177
Lastpage
182
Abstract
A 1-ns high-power high-repetitive excimer laser oscillator has been developed for which the peak power obtained was more than 1 MW with 1-ns pulse width for both XeCl and KrF gas mixtures. The characteristic output power per unit active volume is calculated to be more than 2 GW/L, which is nearly one order larger than that extracted from usual discharge devices. It is inferred that the gain depletion in the active medium under such an extremely large output power condition has led to successful pulse shortening. The device can be operated at a repetition frequency of at least 500 Hz without a gas circulation system. The beam divergence was reduced to near the diffraction limit, although the oscillated-pulse width is only 1 ns.<>
Keywords
excimer lasers; krypton compounds; xenon compounds; 1 MW; 1 ns; KrF gas mixture; XeCl gas mixture; beam divergence; characteristic output power; diffraction limit; gain depletion; high-power high-repetitive excimer laser oscillator; oscillated-pulse width; peak power; repetition frequency; unit active volume; Electrodes; Frequency; Gas lasers; Laser fusion; Laser mode locking; Optical design; Optical pulses; Oscillators; Power lasers; Pulse amplifiers;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/3.112
Filename
112
Link To Document