• DocumentCode
    870535
  • Title

    1-ns high-power high-repetitive excimer laser oscillator

  • Author

    Yamada, Kawakatsu ; Miyazaki, Kenzo ; Hasama, Toshifumi ; Sato, Takuzo

  • Author_Institution
    Electrotech. Lab., Ibaraki, Japan
  • Volume
    24
  • Issue
    2
  • fYear
    1988
  • Firstpage
    177
  • Lastpage
    182
  • Abstract
    A 1-ns high-power high-repetitive excimer laser oscillator has been developed for which the peak power obtained was more than 1 MW with 1-ns pulse width for both XeCl and KrF gas mixtures. The characteristic output power per unit active volume is calculated to be more than 2 GW/L, which is nearly one order larger than that extracted from usual discharge devices. It is inferred that the gain depletion in the active medium under such an extremely large output power condition has led to successful pulse shortening. The device can be operated at a repetition frequency of at least 500 Hz without a gas circulation system. The beam divergence was reduced to near the diffraction limit, although the oscillated-pulse width is only 1 ns.<>
  • Keywords
    excimer lasers; krypton compounds; xenon compounds; 1 MW; 1 ns; KrF gas mixture; XeCl gas mixture; beam divergence; characteristic output power; diffraction limit; gain depletion; high-power high-repetitive excimer laser oscillator; oscillated-pulse width; peak power; repetition frequency; unit active volume; Electrodes; Frequency; Gas lasers; Laser fusion; Laser mode locking; Optical design; Optical pulses; Oscillators; Power lasers; Pulse amplifiers;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/3.112
  • Filename
    112