DocumentCode :
871287
Title :
Gamma Total Dose Effects on ALS Bipolar Oxide Sidewall Isolated Devices
Author :
Buschbom, Milton L. ; Jeffrey, Edward N. ; Rhine, Loran E. ; Spratt, David B.
Author_Institution :
Texas Instruments Incorporated
Volume :
30
Issue :
6
fYear :
1983
Firstpage :
4105
Lastpage :
4109
Abstract :
Advances in bi-polar technology that increase device performance through the use of oxide sidewall isolation have revived concerns about total dose radiation effects. Extensive Cobalt 60 tests of Texas Instruments ALS devices were conducted and comparative results of "walled" and "nested" emitter devices are included. It was determined that inversion at the Si-SiO2 interface between the isolation oxide and residual EPI material was the source of IIH leakage. Controls were established to improve gamma total dose tolerance.
Keywords :
Circuits; Dielectric substrates; Electrostatic discharge; Etching; Oxidation; Protection; Resists; Schottky diodes; Silicon; Testing;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1983.4333090
Filename :
4333090
Link To Document :
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