DocumentCode :
8714
Title :
Theory of Carriers Transport in III-Nitride Materials: State of the Art and Future Outlook
Author :
Bellotti, Enrico ; Bertazzi, Francesco ; Shishehchi, Sara ; Matsubara, Masaki ; Goano, Michele
Author_Institution :
Dept. of Electr. & Comput. Eng., Boston Univ., Boston, MA, USA
Volume :
60
Issue :
10
fYear :
2013
fDate :
Oct. 2013
Firstpage :
3204
Lastpage :
3215
Abstract :
In this paper, we describe the state of the art in the numerical simulation of the carrier transport properties of GaN and its ternary alloys. We outline the characteristics of our state of the art full-band Monte Carlo model that includes a fitting parameter free approach to compute the carrier-phonon interaction and a full quantum mechanical model for multiband transport which is critical to understand the high-field transport properties of these materials. Finally, we provide several examples of applications of the model to the calculation of the low-field electron mobility of GaN and In0.18Al0.82N, drift velocity in GaN and the impact ionization coefficients in AlxGa1-xN alloys.
Keywords :
III-V semiconductors; Monte Carlo methods; aluminium compounds; electron mobility; gallium compounds; impact ionisation; indium compounds; wide band gap semiconductors; AlGaN; GaN; III-nitride materials; InAlN; carrier transport model; carrier-phonon interaction; drift velocity; full-band Monte Carlo model; impact ionization coefficients; low-field electron mobility; multiband transport; quantum mechanical model; ternary alloys; AlGaN; GaN; InAlN; Monte Carlo transport simulation; density functional theory; electronic structure;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2266577
Filename :
6547177
Link To Document :
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