• DocumentCode
    871537
  • Title

    Annealing of Total Dose Damage in the Z8OA Microprocessor

  • Author

    Johnston, Allan H.

  • Author_Institution
    Boeing Aerospace Company Seattle, Washington 98124
  • Volume
    30
  • Issue
    6
  • fYear
    1983
  • Firstpage
    4251
  • Lastpage
    4255
  • Abstract
    Very large annealing rates have been observed for total dose damage in a commercial microprocessor. The annealing behavior has a complex dependence on bias conditions and dose rate, and persists for time periods in excess of 106 s. With positive bias applied, super recovery of the gate threshold voltage occurs so that the voltage shift at long times is opposite to that observed at short times after irradiation. These effects can cause large errors in total dose testing, and need to be carefully considered when planning tests on LSI devices.
  • Keywords
    Annealing; Fabrication; Interface states; Large scale integration; MOS capacitors; MOS devices; Manufacturing processes; Microprocessors; Testing; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1983.4333117
  • Filename
    4333117