DocumentCode
871537
Title
Annealing of Total Dose Damage in the Z8OA Microprocessor
Author
Johnston, Allan H.
Author_Institution
Boeing Aerospace Company Seattle, Washington 98124
Volume
30
Issue
6
fYear
1983
Firstpage
4251
Lastpage
4255
Abstract
Very large annealing rates have been observed for total dose damage in a commercial microprocessor. The annealing behavior has a complex dependence on bias conditions and dose rate, and persists for time periods in excess of 106 s. With positive bias applied, super recovery of the gate threshold voltage occurs so that the voltage shift at long times is opposite to that observed at short times after irradiation. These effects can cause large errors in total dose testing, and need to be carefully considered when planning tests on LSI devices.
Keywords
Annealing; Fabrication; Interface states; Large scale integration; MOS capacitors; MOS devices; Manufacturing processes; Microprocessors; Testing; Threshold voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1983.4333117
Filename
4333117
Link To Document