DocumentCode :
871537
Title :
Annealing of Total Dose Damage in the Z8OA Microprocessor
Author :
Johnston, Allan H.
Author_Institution :
Boeing Aerospace Company Seattle, Washington 98124
Volume :
30
Issue :
6
fYear :
1983
Firstpage :
4251
Lastpage :
4255
Abstract :
Very large annealing rates have been observed for total dose damage in a commercial microprocessor. The annealing behavior has a complex dependence on bias conditions and dose rate, and persists for time periods in excess of 106 s. With positive bias applied, super recovery of the gate threshold voltage occurs so that the voltage shift at long times is opposite to that observed at short times after irradiation. These effects can cause large errors in total dose testing, and need to be carefully considered when planning tests on LSI devices.
Keywords :
Annealing; Fabrication; Interface states; Large scale integration; MOS capacitors; MOS devices; Manufacturing processes; Microprocessors; Testing; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1983.4333117
Filename :
4333117
Link To Document :
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