DocumentCode :
871604
Title :
Thin-film lateral bipolar transistor in silicon-on-sapphire structure
Author :
Zuleeg, R. ; Knoll, Peter
Author_Institution :
Hughes Aircraft Co., Applied Solid State Research Department, Newport Beach, USA
Volume :
3
Issue :
4
fYear :
1967
fDate :
4/1/1967 12:00:00 AM
Firstpage :
137
Lastpage :
139
Abstract :
Heteroepitaxial films of silicon-on-sapphire were used to fabricate lateral bipolar n-p-n transistors. The devices have a common-base direct-current amplification factor of 0.9 and a maximum frequency of oscillation of 2.4 GHz. As a result of the vertical p-n-junction arrangement, small junction areas are possible, e.g. 1×10¿6cm2, which yield depletion-layer capacitances of 0.02¿0.05 pF.
Keywords :
instrumentation; integrated circuits; transistors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19670107
Filename :
4207167
Link To Document :
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