Title :
Thin-film lateral bipolar transistor in silicon-on-sapphire structure
Author :
Zuleeg, R. ; Knoll, Peter
Author_Institution :
Hughes Aircraft Co., Applied Solid State Research Department, Newport Beach, USA
fDate :
4/1/1967 12:00:00 AM
Abstract :
Heteroepitaxial films of silicon-on-sapphire were used to fabricate lateral bipolar n-p-n transistors. The devices have a common-base direct-current amplification factor of 0.9 and a maximum frequency of oscillation of 2.4 GHz. As a result of the vertical p-n-junction arrangement, small junction areas are possible, e.g. 1Ã10¿6cm2, which yield depletion-layer capacitances of 0.02¿0.05 pF.
Keywords :
instrumentation; integrated circuits; transistors;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19670107