DocumentCode :
87182
Title :
Fabrication of Single Si Nanowire Metal–Semiconductor–Metal Device for Photodetection
Author :
Das, Kaustuv ; Samanta, Sudeshna ; Kumar, Prashant ; Narayan, K.S. ; Raychaudhuri, Arup Kumar
Author_Institution :
S.N. Bose Nat. Centre for Basic Sci., Kolkata, India
Volume :
61
Issue :
5
fYear :
2014
fDate :
May-14
Firstpage :
1444
Lastpage :
1450
Abstract :
The photoresponse of a metal-semiconductor-metal (MSM) device using single silicon nanowire (Si NW) (~50-nm diameter) with responsivity approaching 3 A/W and external quantum efficiency ~900% at a moderate bias of 1.0 V is reported. The device exhibits a rapid switching of the current when the light of wavelength 405 nm is turned ON/OFF even at zero bias. The dark and illuminated current-voltage characteristics are studied using the MSM device model. The analysis indicates that a dominant contribution to the photoresponse arises from the reduction of the barrier at the contact regions along with photoconductive response in the strand of the Si NW.
Keywords :
elemental semiconductors; metal-semiconductor-metal structures; nanowires; photodetectors; semiconductor quantum wires; silicon; MSM device model; Si; contact regions; current-voltage characteristics; dominant contribution; photoconductive response; quantum efficiency; single silicon nanowire; voltage 1 V; wavelength 405 nm; zero bias; Fabrication; Lighting; Nanoscale devices; Photoconductivity; Photodetectors; Resistance; Silicon; Metal??semiconductor??metal (MSM) device; photodetector; responsivity; silicon nanowire (Si NW);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2312234
Filename :
6802466
Link To Document :
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