• DocumentCode
    872176
  • Title

    Control of liquid flow distribution utilizing EHD conduction pumping mechanism

  • Author

    Feng, Yinshan ; Seyed-Yagoobi, Jamal

  • Author_Institution
    Foxconn/Foxflow Thermal Technol. Inc., Austin, TX, USA
  • Volume
    42
  • Issue
    2
  • fYear
    2006
  • Firstpage
    369
  • Lastpage
    377
  • Abstract
    A maldistribution of liquid flow in parallel evaporators may cause local hot areas, leading to dry-out of branch lines and resulting in a nonoptimum performance. The electrohydrodynamic (EHD) conduction pumping shows its potential as an active control method of the flow distribution. The EHD conduction pumping is associated with the heterocharge layers of finite thickness in the vicinity of the electrodes, which are based on the process of dissociation of the neutral electrolytic species and recombination of the generated ions. This paper presents the successful control of liquid flow distribution between two branch lines utilizing an EHD conduction pump at total mass flux levels of 100 and 200 kg/m2·s.
  • Keywords
    electrodes; electrohydrodynamics; flow control; pumps; EHD conduction pumping; active control method; branch lines; electrodes; electrohydrodynamic; heterocharge layers; ions recombination; liquid flow distribution control; neutral electrolytic species; parallel evaporators; Electrodes; Electrohydrodynamics; Fluid flow; Industry Applications Society; Maldistribution; Optical polarization; Permittivity; Pumps; Thermal management; Weight control; Electrohydrodynamic (EHD); flow control; liquid distribution; pumping;
  • fLanguage
    English
  • Journal_Title
    Industry Applications, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-9994
  • Type

    jour

  • DOI
    10.1109/TIA.2005.863909
  • Filename
    1608212