• DocumentCode
    872286
  • Title

    Influence of buffer layer thickness on DC performance of GaAs/AlGaAs heterojunction bipolar transistors grown on silicon substrates

  • Author

    Ma, Tony ; Ueda, Daisuke ; Lee, Won-Seong ; Adkisson, J. ; Harris, James S., Jr.

  • Author_Institution
    Electron. Lab., Stanford Univ., CA, USA
  • Volume
    9
  • Issue
    12
  • fYear
    1988
  • Firstpage
    657
  • Lastpage
    659
  • Abstract
    The DC performance of GaAs/AlAs heterojunction bipolar transistors (HBTs) grown on silicon substrates with buffer layers ranging from 0 to 5 mu m was investigated. Current gain, collector-emitter breakdown voltage, emitter-base and collector-base diode ideality factors, and breakdown voltages were measured as the buffer layer thickness was varied between 0 and 5 mu m. The current gain steadily increases with increasing buffer layer thickness until the layer reaches 3 mu m. However, the other DC parameters are relatively insensitive to the buffer layer thickness. A small-signal current gain of 60 is typically achieved for devices with 6*6- mu m/sup 2/ emitters at a density of 6*10/sup 4/ A/cm/sup 2/ when the buffer layer is >or=3 mu m.<>
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; heterojunction bipolar transistors; semiconductor device testing; 0 to 5 micron; DC performance; GaAs-AlGaAs; HBTs; Si substrate; buffer layer thickness; collector-base diode ideality factors; collector-emitter breakdown voltage; current gain; emitter base diode ideality; heterojunction bipolar transistors; small-signal current gain; Buffer layers; Current measurement; Diodes; Gain measurement; Gallium arsenide; Heterojunction bipolar transistors; Laboratories; Molecular beam epitaxial growth; Silicon; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.20427
  • Filename
    20427